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Oxygen Plasma Surface Treatment onto ITO Surface for OLEDs Based on
Europium Complex
G. Santos, M. R. Cavallari, F. J. Fonseca, and L. Pereira
MWCNT Devices Fabricated by Dielectrophoresis: Study of Their Electrical
Behavior Related to Deposited Nanotube Amount for Gas Sensing Applications
E. Galeazzo, M. C. Moraes, H. E. M. Peres, M. O.S. Dantas, V. G.C. Lobo, and
F. J. RamirezFernandez
Multi-Chip Module (MCM-D) Using Thin Film Technology
C. B. Adamo, A. Flacker, W. Freitas, R. C. Teixeira, M. O. da Silva, and
A. L. P. Rotondaro
Mitigating MOSFET Radiation Effects by Using the Wave Layout in
Analog ICs Applications
R. N. de Souza, M. A. G. da Silveira, and S. P. Gimenez
Effect of substrate type on structure of TiO2 thin film deposited by
atomic layer deposition technique
R. S. Pessoa, F. P. Pereira, G. E. Testoni, W. Chiappim, H. S. Maciel, and
L. V. Santos.
The Influence of Back Gate Bias on the OCTO SOI MOSFET's
Response to X-ray Radiation
L. N. de S. Fino, M. A. G. Silveira, C. Renaux, D. Flandre, and S. P. Gimenez
Physical characterization of hafnium aluminates dielectrics deposited by
atomic layer deposition
D. R. Huanca, V. Christiano, C. Adelmann, P. B. Verdonck and
Sebastião G. dos Santos Filho
Cover, back-cover,
foreword and sumario
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