CMOS SOI FINFET

August 31st – 14:00pm – 16:00pm

Room: Wafer

Chair: João Martino

• 14:00h: Reliability challenges for the qualification of Leading Edge CMOS
  Technologies – Invited

  • Fernando Guarin

• 14:40h: Analysis of Carrier Mobility in Triple Gate SOI nFinFET Combining Rotated Substrate and Strain
  • Thales Augusto Ribeiro, Eddy Simoen, Cor Claeys, João Antonio Martino and Marcelo Antonio Pavanello

• 15:00h: Diffuse Interface Modeling for Electromigration Induced Void Growth

  • Leonardo Queiroz and Roberto Orio

• 15:20h: Innovation in Higher Education: specificity of the microelectronics field

  • Olivier Bonnaud

• 15:40h: A modified Shichman-Hodges model for OFETs usable in the Quite Universal Circuit Simulator – (SFORUM)
  • Alex Lima, Muthupandian Cheralathan and Stefan Blawid