FUJITSU LAUNCHES 65NM PROCESS
On the heels of Intel Corp.’s 65nm process announcement, Fujitsu Microelectronics America Inc. (FMA) reported late Tuesday the availability of its own 65nm CS200 and CS200A manufacturing processes for ASIC and COT applications aimed at SoC designs requiring high performance but low power consumption. The CS200 series process is meant for high-end, high-performance server CPU devices and other advanced systems, while applications ...
INTEL CREATES 2ND 65NM MANUFACTURING PROCESS
To allow production of very low-power chips for mobile platforms and small-form factor devices, chip giant Intel Corp. said today it is developing a second 65nm process technology – this one an ultra-low power derivative of its high-performance 65nm logic manufacturing process. Complementing its high-performance, higher power 65nm P1264 process, the P1265 process provides the ability to significantly reduce three main sources of transistor l...
TI TRANSFERS LEAKAGE CURRENT MANAGEMENT TO 65-NM NODE
LONDON — Texas Instruments Inc. claimed Monday (Sept. 19) it had solved the problem of excessive leakage current at the 65-nanometer manufacturing process node with the transfer of its SmartReflex power and performance management technologies from the 90-nm process node to the 65-nm node. TI first introduced technology elements of SmartReflex technologies at the 90-nm process node and deployed in its OMAP...