Yves Danto, Université Bordeaux I, France
Wagner Nunes Rodrigues, Univ. Federal de Minas Gerais, Brazil
Stefan Bengtsson, Chalmers University of Technology, Sweden
Sebastião Gomes dos Santos, Universidade de São Paulo, Brazil
Rogério Furlan, Upr - HUMACAO - Puerto Rico
Roberto R. Panepucci, Florida International University , USA
Renato Perez Ribas, Univ.Federal do Rio Grande do Sul, Brazil
Patrick Bernard Verdonck, Universidade de São Paulo, Brazil
Olivier BONNAUD, University of Rennes 1, France
Nilton Itiro Morimoto, Universidade de São Paulo, Brazil
Newton Cesário Frateschi , UNICAMP, Brazil
Michiel J. Vellekoop, TU-WIEN , Austria
Michael Kraft, ECS/Southampton University, England
Marcelo Antônio Pavanello, Universidade de São Paulo, Brazil
Marc Madou, University of California, USA
Manuel Cid Sánchez USP, BR
Magali Estrada del Cueto, CINVESTAV, Mexico
Linnyer Beatrys Ruiz, Univ.Federal de Minas Gerais, Brazil
Lis Nanver , TU-DELFT, The Netherlands
José Higino Correia, Universidade do Minho, Portugal
José Roberto Tavares Branco, CETEC-MG, Brazil
José Camargo da Costa, Universidade de Brasilia, Brazil
Jorge Santiago-Avilés, Kings Court-English College House, USA
Jean-Pierre Colinge, University of California, USA
Jacobus Swart, UNICAMP, Brazil
Jaap Hoekstra, TU-Delft, The Netherlands
Ioshiaki Doi, UNICAMP/FEEC/DMCSI, Brazil
Homero Maciel , Instituto Tecnológico da Aeronáutica, Brazil
Héctor J. De Los Santos, NanoMEMS Research/LLC, USA
Gleb Vdovin, OKO Technologies, The Netherlands
Flávio O. Plentz Filho, Univ. Federal de Minas Gerais, Brazil
Elena Ioana Gaura, Coventry University, England
Eddy Simoen, IMEC, Belgium
Cor Claeys, IMEC, Belgium
Antônio L. P. Rotondaro, Texas Instruments/SiTD, USA
Antônio Cerdeira, CINVESTAV-IPN, Mexico
Antônio Carlos Seabra, Universidade de São Paulo, Brazil
Alfredo Arnaud, Universidad Católica del Uruguay, Uruguay
Albert J. P. Theuwissen, DALSA Corporation, The Netherlands
Adriano Moehlecke, PUC-RS, Brazil
